Analytical EM session at the Berlin Photonic Days#
The Berlin Photonics Week from October 6-9 will host a dedicated session on Analytical Electron Microscope for Photonics on October 7 as part of the Photonic Days and a tour to PDI with visits of different labs, including the ZALKAL lab, as part of the Photonic Travel Days on October 9.
This session will bring together electron beam technique experts to present their latest applications, discuss scientific results and evaluate recent developments inmeasurement systems. Furthermore, it will provide the broader photonics community to get an idea what they could learn using these microscopy techniques.
Electron beam techniques have emerged as powerful tools for characterising and fabricating a myriad of materials systems at length scales ranging from the micrometres to nanometres. More recently also pulsed electron beams have been used to obtain temporal resolution.
This makes such techniques exciting for next-generation semiconductor and photonics research. Through the use of high-energy electron beams in either scanning or transmission microscopicmodes, the spectroscopic, chemical, structural, and topographical properties of such systems can be investigated using techniques such as cathodoluminescence spectroscopy (CL), scanning transmission electron microscopy (STEM), electron energy loss spectroscopy (EELS), electron tomography (ET), energy dispersive X-ray spectroscopy (EDS), and electron backscatter diffraction (EBSD).
Program of the Session on Oct. 7 2026:
10:00-10:30 “Quantifying plasmons with fast electrons: from momentum-resolved dispersions to absolute loss probabilities”, Hannah Nerl (Humboldt University of Berlin)
10:30-11:00 “Advanced scanning transmission electron microscopy of threading dislocation reduction mechanisms in platforms for silicon-integrated photonics”, Karl Graser (Paul-Drude-Institut für Festkörperelektronik)
11:00-11:30 “Imaging Optical Excitations at the Nanoscale with Laser-Stimulated Vibrational EELS”, Benedikt Haas (Humboldt University of Berlin)
11:30-12:00 “Merging advanced photonics with ultrafast electron microscopy”, Armin Feist (Max-Planck-Institut für Multidisziplinäre Naturwissenschaften)
12:00-14:00 Lunch Break
14:00-14:30 “SEM, EBL, and CL for deterministic fabrication and high-resolution metrology of nanophotonic devices”, Sven Rod (Technische Universität Berlin)
14:30-15:00 “Electron microscopy as a tool for characterizing semiconductor material, analyzing device degradation, and conducting quality control at the FBH”, Carsten Netzel (Ferdinand-Braun-Institut)
15:00-15:00 “Correlative electron microscopy analyses on optoelectronic semiconductor devices”, Daniel Abou-Ras (Helmholtz-Zentrum Berlin HZB)
15:30-16:00 “Correlated high-resolution electron backscatter diffraction and cathodoluminescence mapping for studying the distortion tensor around isolated GaN dislocations”, Domenik Spallek (Paul-Drude-Institut für Festkörperelektronik)
16:00-16:30 Coffee Break
16:30-17:00 “Non-Perturbative Measurement of the Lasing-Mode Photon Population at the Sub-Picoseconds and Nanometer Scale”, Cléo Santini (Centre d’Élaboration de Matériaux et d’Etudes Structurales (CEMES))
17:00-17:30 “From Defects to devices: Electron-based characterization of III-nitride semiconductor nanowire”, Gwénolé Jacopin (Institut Néel)
17:30-18:00 “CL and EBIC microscopy of nitride based optoelectronic devices: into carrier transport and recombination at the nanometerscale”, Gordon Schmid (Institute of Physics, Otto-von-Guericke-University Magdeburg)
